Optimization of wafer clamp with ICP etching Equipment
ICP刻蚀机晶圆夹具寿命优化

摘要

通过分析电感耦合等离子刻蚀系统在刻蚀晶圆的过程中晶圆夹具的重要性和夹具的运动过程和作用，提出了石英和陶瓷两种材料制作的夹具在实际使用过程中的差异和优缺点以及陶瓷夹具对降低设备故障率的作用。

Abstract

Through analyzing the importance of wafer clamp with inductive couple plasma etching system during etching process,and action process and fcuntion with wafer clamp,the differences or merits and demerits about wafer clamps those are made of quartz and ceramics in the actual use are proposed,as well as equipment failure rate can be greatly reduced.